Atomic force microscopy was used to investigate the space molecular organization of Langmuir-Blodgett (LB) and self-assembled (SA) films of pyrrole derivatives on different substrates. The LB films were obtained from monomers of 3-hexadecyl-pyrrole (3HP); the polymerization of the film was performed directly at the air-subphase interface, and the films were collected on hydrophilic glass. Very homogeneous polymeric and monomeric LB films were collected on glass with a transfer rate near unity, the typical average roughness range was 0.9 +/- 0.4 nm, and the quality of films was independent of the dipping speed. A functionalized molecule, 11-(3-pyrrolyl) undecyl mercaptane (3UPSH), was used to modify Ti and TiN electrodes by immersing the substrates in a solution containing the redox active molecule. The modification of the metal surfaces was proved by means of time of flight secondary ion mass spectrometry (TOF SIMS) and AFM characterization.
Scanning probe characterization of Langmuir-Blodgett and self-assembled films of pyrrole derivatives
RUGGERI, GIACOMO;
1998-01-01
Abstract
Atomic force microscopy was used to investigate the space molecular organization of Langmuir-Blodgett (LB) and self-assembled (SA) films of pyrrole derivatives on different substrates. The LB films were obtained from monomers of 3-hexadecyl-pyrrole (3HP); the polymerization of the film was performed directly at the air-subphase interface, and the films were collected on hydrophilic glass. Very homogeneous polymeric and monomeric LB films were collected on glass with a transfer rate near unity, the typical average roughness range was 0.9 +/- 0.4 nm, and the quality of films was independent of the dipping speed. A functionalized molecule, 11-(3-pyrrolyl) undecyl mercaptane (3UPSH), was used to modify Ti and TiN electrodes by immersing the substrates in a solution containing the redox active molecule. The modification of the metal surfaces was proved by means of time of flight secondary ion mass spectrometry (TOF SIMS) and AFM characterization.I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.
