Thin film lithium niobate (TFLN) enables a high-performance integration platform thanks to its superior electro-optic properties and broad transparency range. In this contribution, we discuss preliminary results toward the exploitation of TFLN in the 1064nm window, further enhancing its versatility for telecommunications and sensing applications.

Lithium Niobate on Insulator Technology for applications in the 1064 nm Window

Andriolli, N.
Ultimo
2024-01-01

Abstract

Thin film lithium niobate (TFLN) enables a high-performance integration platform thanks to its superior electro-optic properties and broad transparency range. In this contribution, we discuss preliminary results toward the exploitation of TFLN in the 1064nm window, further enhancing its versatility for telecommunications and sensing applications.
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11568/1299570
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