In this paper the electrochemical silicon etching in HF-based solution is demonstrated as a new technique for silicon micromachining, alternative to commonly used methods. Electrochemical etching of silicon in HF-based electrolyte, a well known technique for regular macropore formation, is here exploited to produce a multitude of different regular silicon microstructures (microtubes, microtips, microchannels, microspirals, micropillars, microwalls, etc.). The electrochemical micromachining technique is here detailed and discussed.
Electrochemical silicon micromachining: A new technique
BARILLARO, GIUSEPPE;PENNELLI, GIOVANNI
2004-01-01
Abstract
In this paper the electrochemical silicon etching in HF-based solution is demonstrated as a new technique for silicon micromachining, alternative to commonly used methods. Electrochemical etching of silicon in HF-based electrolyte, a well known technique for regular macropore formation, is here exploited to produce a multitude of different regular silicon microstructures (microtubes, microtips, microchannels, microspirals, micropillars, microwalls, etc.). The electrochemical micromachining technique is here detailed and discussed.File in questo prodotto:
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