Polycrystalline silicon-germanium (poly-SiGe) is a promising structural material for the post-processing of micro electro-mechanical systems (MEMS) on top of complementary metal-oxide-semiconductor (CMOS) substrates. Combining MEMS and CMOS allows for the development of high-performance devices. We present for the first time selective protein immobilization on top of poly-SiGe surfaces, an enabling technique for the development of novel poly-SiGe based MEMS biosensors. Active regions made of 3-aminopropyl-triethoxysilane (APTES) were defined using silane deposition onto photoresist patterns followed by lift-off in organic solvents. Subsequently, proteins were covalently bound on the created APTES patterns. Fluorescein-labeled human serum albumin (HSA) was used to verify the immobilization procedure while the binding capability of the protein layer was tested by an antigen-labeled antibody pair. Inspection by fluorescence microscopy showed protein immobilization inside the desired bioactive areas and low non-specific adsorption outside the APTES pattern. Furthermore, the quality of the silane patches was investigated by treatment with 30 nm-diameter gold nanoparticles and scanning electron microscope observation. The developed technique is therefore a promising first step towards the realization of poly-SiGe based biosensors. (C) 2010 Elsevier B.V. All rights reserved.
|Autori:||Lenci S; Tedeschi L; Domenici C; Lande C; Nannini A; Pennelli G; Pieri F; Severi S|
|Titolo:||Protein patterning on polycrystalline silicon-germanium via standard UV lithography for bioMEMS applications|
|Anno del prodotto:||2010|
|Digital Object Identifier (DOI):||10.1016/j.msec.2010.07.002|
|Appare nelle tipologie:||1.1 Articolo in rivista|