Several copolymers of fluorinated acrylates and methacrylates with unfluorinated acrylates, methacrylates and vinyl ethers have been synthesized, and thin films of these materials have been evaluated in terms of chemical stability under accelerated photoaging conditions. Either commercially available or specifically synthesized fluorinated acrylic comonomers, such as methyl -trifluoromethyl acrylate (MTFMA) and ethyl 3,3-difluoro-2-methylpropenoate (MFPE), were employed. If suitably selected, these fluoroacrylates can allow both control on the macromolecular structure and tailoring of material properties that are relevant for coating applications, such as film-forming behavior, adhesion, water repellency and intrinsic photostability. The photodegradation behavior of partially fluorinated copolymers and of their unfluorinated analogues was compared, and specific structural features responsible for crosslinking and/or bond scission reactions were analysed.
Design of Fluorinated Acrylic-Based Polymers as Water Repellent, Intrinsically Photostable Coating Materials for Stone
CASTELVETRO, VALTER;AGLIETTO, MAURO;CIARDELLI, FRANCESCO;
2001-01-01
Abstract
Several copolymers of fluorinated acrylates and methacrylates with unfluorinated acrylates, methacrylates and vinyl ethers have been synthesized, and thin films of these materials have been evaluated in terms of chemical stability under accelerated photoaging conditions. Either commercially available or specifically synthesized fluorinated acrylic comonomers, such as methyl -trifluoromethyl acrylate (MTFMA) and ethyl 3,3-difluoro-2-methylpropenoate (MFPE), were employed. If suitably selected, these fluoroacrylates can allow both control on the macromolecular structure and tailoring of material properties that are relevant for coating applications, such as film-forming behavior, adhesion, water repellency and intrinsic photostability. The photodegradation behavior of partially fluorinated copolymers and of their unfluorinated analogues was compared, and specific structural features responsible for crosslinking and/or bond scission reactions were analysed.I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.
