In this paper photo-electrochemical etching of silicon in HF-based solutions is employed as a versatile technique for fabrication of original silicon microstructures, alternative to commonly used methods. Photo-electrochemical etching, a well known technique for regular macropore formation, has been exploited to produce a multitude of different regular silicon microstructures (microtubes, microtips, microchannels, microspirals, micropillars, microwalls, etc.). This micromachining technique is here detailed and some applications are reported.
Fabrication of regular silicon microstructures by photo-electrochemical etching of silicon
BARILLARO, GIUSEPPE;BRUSCHI, PAOLO;DILIGENTI, ALESSANDRO;NANNINI, ANDREA
2005-01-01
Abstract
In this paper photo-electrochemical etching of silicon in HF-based solutions is employed as a versatile technique for fabrication of original silicon microstructures, alternative to commonly used methods. Photo-electrochemical etching, a well known technique for regular macropore formation, has been exploited to produce a multitude of different regular silicon microstructures (microtubes, microtips, microchannels, microspirals, micropillars, microwalls, etc.). This micromachining technique is here detailed and some applications are reported.File in questo prodotto:
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