We present first results on the irradiation of double-sided silicon microstrip detectors and test structures performed at the Elettra synchrotron radiation facility at Trieste, Italy. The devices were irradiated with 900 MeV electrons. The test structures we used for studying bulk, surface and oxide irradiation damage were guard ring diodes, gated diodes and MOS capacitors. The test structures and the double-sided microstrip detectors were produced by Micron Semiconductor Ltd. (England) and IRST (Trento, Italy). For the first time, bulk-type inversion is observed to occur after high-energy electron irradiation. Current and inter-strip resistance measurements performed on the microstrip detectors show that the devices are still usable after type inversion. (C) 2002 Elsevier Science B.V. All rights reserved.
|Autori interni:||BETTARINI, STEFANO|
|Autori:||Rachevskaia I; Bettarini S; Bosisio L; Dittongo S; Quai E; Rizzo G|
|Titolo:||Radiation damage of silicon structures with electrons of 900 MeV|
|Anno del prodotto:||2002|
|Digital Object Identifier (DOI):||10.1016/S0168-9002(02)00543-0|
|Appare nelle tipologie:||1.1 Articolo in rivista|