We have produced by pulsed laser deposition thin films of Er-doped LiYF4 onto silicon. Substrate coating turns out efficient, due to the strong coupling between the UV pulsed laser radiation and the fluoride target. Samples have been analyzed by fluorescence emission spectroscopy upon pulsed excimer laser excitation and spectra compared to those of the bulk target. Furthermore, upconversion effect has been verified in the thin film with near-infrared excitation. The results, suggesting the occurrence of nonlinear phenomena, are encouraging in view of possible applications in optoelectronics and photonics devices and demonstrate the feasibility of pulsed laser deposited Er-doped fluoride films. (C) 2003 Elsevier B.V. All rights reserved.
|Autori:||Camposeo A; Fuso F; Arimondo E; Toncelli A; Tonelli M|
|Titolo:||Er-LiYF4 coating of Si-based substrates by pulsed laser deposition|
|Anno del prodotto:||2004|
|Digital Object Identifier (DOI):||10.1016/j.surfcoat.2003.10.103|
|Appare nelle tipologie:||1.1 Articolo in rivista|