The realization of a monocrystalline nanofilm of Nd3+-doped fluoride on LiYF4 substrates by pulsed laser deposition is reported. The film was obtained by laser ablation with 355 run photons of a bulk LiYF4 crystal doped with Nd3+ ions at 1.5% atomic concentration. The measurements of the sample thickness obtained by an in situ interferometric technique, and the film optical characteristics analyzed via laser induced fluorescence spectroscopy upon UV and IR excitation, are presented. Lifetime measurements of the fundamental Nd3+ ion transition in the film were also performed. All the results were compared with those obtained in a Nd3+:LiYF4 bulk crystal. The emission spectra of the deposited film following IR excitation seem to indicate the obtained deposit is Nd3+:YF3. (c) 2007 Elsevier B.V All rights reserved.
|Autori interni:||DI LIETO, ALBERTO|
|Autori:||Barsanti S.; Comacchia F.; Di Lieto A.; Toncelli A.; Tonelli M; Bicchi P.|
|Titolo:||Nd3+-doped fluoride film grown on LiYF4 substrate by pulsed laser deposition|
|Anno del prodotto:||2008|
|Digital Object Identifier (DOI):||10.1016/j.tsf.2007.06.144|
|Appare nelle tipologie:||1.1 Articolo in rivista|