A simple method for the fabrication of films with an high density of nanometric metal grains is presented and discussed. The method is based on the successive evaporation of different metals (Au, Al and In), with different melting points: after each evaporation, rapid thermal annealing treatments are used to induce agglomeration of the deposited material. The nanograin agglomeration (in particular of the Al film) resulted strongly dependent on the previous nanograin (gold) distribution and concentration. Statistics of gold based nanograin films, deposited on silicon dioxide, are presented for different gold thickness and annealing parameters. Results on Al induced agglomeration of a successively evaporated thin film are shown for different Au nanoparticle distribution and concentration. A final indium deposition, with suitable annealing temperature and time, produces films with a very high density of metal nanoparticles (more than 2000 nanograins/1m2, average radius between 5 and 10 nm).