We have developed a Monte Carlo simulator of the electromigration process in polycrystalline metal stripes. Stripes with different average grain size can be generated with Voronoi tasselation, and mapped on to a network of resistors. The proposed model includes the major role played by grain boundaries and by the current density redistribution within the stripe following void formation. Simulations of stripes with different grain sizes and different widths are shown, and a few expressions for the failure probability are compared on the basis of their capability of reproducing the experimental results. In addition, electromigration noise has been computed, recovering the characteristic 1/fγ (γ≈2) behavior. The substantial qualitative agreement between our calculations and the experimental results is a convincing test of the capability of the model proposed to include the relevant physics
Monte-Carlo Simulation of Electromigration in Polycrystalline Metal Stripes
DI PASCOLI, STEFANO;IANNACCONE, GIUSEPPE
1999-01-01
Abstract
We have developed a Monte Carlo simulator of the electromigration process in polycrystalline metal stripes. Stripes with different average grain size can be generated with Voronoi tasselation, and mapped on to a network of resistors. The proposed model includes the major role played by grain boundaries and by the current density redistribution within the stripe following void formation. Simulations of stripes with different grain sizes and different widths are shown, and a few expressions for the failure probability are compared on the basis of their capability of reproducing the experimental results. In addition, electromigration noise has been computed, recovering the characteristic 1/fγ (γ≈2) behavior. The substantial qualitative agreement between our calculations and the experimental results is a convincing test of the capability of the model proposed to include the relevant physicsI documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.
