High-quality Ge/Si(0.15)Ge(0.85) multiple quantum wells have been grown by low-energy plasma-enhanced chemical vapor deposition. Structural and optical properties have been measured by x-ray diffraction, optical transmission, photoluminescence and photocurrent experiments.
Titolo: | Ge/SiGe Multiple Quantum Wells for Optical Applications |
Autori interni: | |
Anno del prodotto: | 2008 |
Abstract: | High-quality Ge/Si(0.15)Ge(0.85) multiple quantum wells have been grown by low-energy plasma-enhanced chemical vapor deposition. Structural and optical properties have been measured by x-ray diffraction, optical transmission, photoluminescence and photocurrent experiments. |
Handle: | http://hdl.handle.net/11568/230003 |
ISBN: | 9781424417698 |
Appare nelle tipologie: | 4.1 Contributo in Atti di convegno |
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