High-quality Ge/Si(0.15)Ge(0.85) multiple quantum wells have been grown by low-energy plasma-enhanced chemical vapor deposition. Structural and optical properties have been measured by x-ray diffraction, optical transmission, photoluminescence and photocurrent experiments.

Ge/SiGe Multiple Quantum Wells for Optical Applications

VIRGILIO, MICHELE;GROSSO, GIUSEPPE;
2008-01-01

Abstract

High-quality Ge/Si(0.15)Ge(0.85) multiple quantum wells have been grown by low-energy plasma-enhanced chemical vapor deposition. Structural and optical properties have been measured by x-ray diffraction, optical transmission, photoluminescence and photocurrent experiments.
2008
9781424417698
File in questo prodotto:
Non ci sono file associati a questo prodotto.

I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.

Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11568/230003
 Attenzione

Attenzione! I dati visualizzati non sono stati sottoposti a validazione da parte dell'ateneo

Citazioni
  • ???jsp.display-item.citation.pmc??? ND
  • Scopus ND
  • ???jsp.display-item.citation.isi??? 2
social impact