High-quality Ge/Si(0.15)Ge(0.85) multiple quantum wells have been grown by low-energy plasma-enhanced chemical vapor deposition. Structural and optical properties have been measured by x-ray diffraction, optical transmission, photoluminescence and photocurrent experiments.

Ge/SiGe Multiple Quantum Wells for Optical Applications

VIRGILIO, MICHELE;GROSSO, GIUSEPPE;
2008

Abstract

High-quality Ge/Si(0.15)Ge(0.85) multiple quantum wells have been grown by low-energy plasma-enhanced chemical vapor deposition. Structural and optical properties have been measured by x-ray diffraction, optical transmission, photoluminescence and photocurrent experiments.
9781424417698
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Utilizza questo identificativo per citare o creare un link a questo documento: http://hdl.handle.net/11568/230003
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