Cholesteryl polysulfides derivatives, containing a number of sulfur atoms comprised from 2 to 6 and suitable for the formation of self-assembled monolayer have been prepared utilizing a known procedure modified by us. The compounds were isolated and characterized by HPLC–MS, 1H NMR, FT-IR techniques. Self-assembly methodology was adopted in order to obtain uniform layers and the patterning suitability was tested with microcontact printing technique. Contact angle measurements and atomic force microscopy revealed interesting surface modifications.
Use of cholesteryl polysulfides in self-assembly and soft lithography on Au(111) and ITO
PISIGNANO, DARIO
2005-01-01
Abstract
Cholesteryl polysulfides derivatives, containing a number of sulfur atoms comprised from 2 to 6 and suitable for the formation of self-assembled monolayer have been prepared utilizing a known procedure modified by us. The compounds were isolated and characterized by HPLC–MS, 1H NMR, FT-IR techniques. Self-assembly methodology was adopted in order to obtain uniform layers and the patterning suitability was tested with microcontact printing technique. Contact angle measurements and atomic force microscopy revealed interesting surface modifications.File in questo prodotto:
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