Simulation of contact resistance in patterned graphene

While trying to exploit graphene in Radio Frequency applications, the reduction of the contact resistance (Rc) is probably one of the most challenging technological issues to be solved. Graphene patterning under the metal has been demonstrated to be a promising solution, leading to a reduction of Rc by up to a factor of 20, probably due to an increased conductivity at the borders of the patterns of graphene. This technology is still at the early stage and a complete understanding of the physical mechanisms at play is lacking. To this purpose we propose a multi- scale approach based on first-principle calculations, and the solution of the continuity equation to compute Rc in the considered patterned contacts.